Photosensitive resin composition, resin curing film and image display device

TW202637656APending Publication Date: 2026-09-16RESONAC CORP
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Patent Information

Application Number
TW114149415
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-08-07
Filing Date
2025-12-16
Publication Date
2026-09-16
Patent Text Reader

Abstract

A photosensitive resin composition comprising copolymer (A-1), copolymer (A-2), photopolymerization initiator (C), and solvent (D); copolymer (A-1) comprises hydroxyl groups, a unit having a blocked isocyanate group (a), a unit having a nitrogen atom (b), and a unit having an acid group (c); the unsaturated group equivalent of copolymer (A-2) is 30~3000 g / mol.
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