Compositions and methods for vapor phase surface modification

TW202637780APending Publication Date: 2026-09-16FUJIFILM ELECTRONIC MATERIALS U S A INC
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Patent Information

Application Number
TW114144538
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-15
Filing Date
2025-11-14
Publication Date
2026-09-16
Patent Text Reader

Abstract

This disclosure provides surface treatment compositions and methods for use thereof. In some embodiments, the compositions are dispersed onto the surface of a substrate in a vapor phase. In some embodiments, the compositions are dispersed onto the surface of the substrate in a liquid phase.
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