A method for reversing negative ceria particles and corresponding chemical mechanical polishing slurries

TW202637787APending Publication Date: 2026-09-16ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD
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Patent Information

Application Number
TW114147271
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-12
Filing Date
2025-12-03
Publication Date
2026-09-16

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Abstract

The invention employs a method of combining polyquaternary ammonium salts with small-molecule quaternary ammonium compounds to reverse the charge of negative ceria particles, effectively enhancing the removal rates of TEOS and Si to reach
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