Process chamber process kit with protective coating

TW202637863APending Publication Date: 2026-09-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW114136988
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-03
Filing Date
2025-09-25
Publication Date
2026-09-16

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    Figure TWG2TA001076278_002
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    Figure TWG2TA001076278_003
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Abstract

A chamber component for a plasma process chamber and methods of fabricating and using the same are provided. In one aspect, a chamber component used within a plasma processing chamber is provided. The chamber component includes a metallic base material that has a surface having an average peak-to-valley distance, RzAVG, of less than or equal to about
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