Oxide semiconductor thin films, multilayers and sputtering targets

TW202637866APending Publication Date: 2026-09-16KOBELCO RES INST INC
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Patent Information

Application Number
TW115107484
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-12-09
Filing Date
2026-03-02
Publication Date
2026-09-16

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Abstract

The purpose of this disclosure is to provide an oxide semiconductor thin film that can improve carrier mobility while reducing carrier density. The oxide semiconductor thin film disclosed herein contains elements of O, In, and other metals, and has a crystalline structure comprising a manganese perforate.
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