Semiconductor process equipment, gas distribution member and gas inlet assembly thereof

Abstract

Semiconductor process equipment and its gas distribution member and gas inlet assembly belong to the field of semiconductor technology. The semiconductor process equipment includes a chamber body, a base, and a support shaft. The base is disposed within the chamber body, and the support shaft passes through the chamber body and is connected to the base. The gas distribution member has an annular structure. In addition, the gas distribution member is sleeved over the support shaft and connected to the chamber body. The gas distribution member has a gas distribution channel that diverts the cleaning gas, causing it to form a rotating airflow around the support shaft as it flows out. By using an annular gas distribution member and sleeving it over the support shaft, the cleaning gas is divided into multiple airflows in the circumferential direction of the support shaft. These multiple airflows simultaneously flow towards the area below the base, thus improving the uniformity of the cleaning gas in the circumferential direction of the support shaft.

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