Condensation detection for vapor precursor delivery in semiconductor manufacturing

TW202637889APending Publication Date: 2026-09-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW114146420
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-11-26
Filing Date
2025-11-27
Publication Date
2026-09-16

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Abstract

Methods and systems for detecting condensation for vapor precursor delivery in a manufacturing system. A flow of a vapor in a vapor delivery line is terminated and one or more pressure measurements of the vapor delivery line are obtained. A vapor quantity is determined based on the one or more pressure measurements. The vapor quantity and a supply pressure of the vapor delivery line are processed using a model that outputs a condensation risk level in the vapor delivery line. Upon determining that the condensation risk level satisfies a condensation risk criterion, an alert indicating detection of a condensate in the vapor delivery line is generated.
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