Semiconductor manufacturing equipment

Abstract

The present invention provides a semiconductor manufacturing apparatus capable of suppressing the backflow of unwanted byproducts contained in exhaust gas. The semiconductor manufacturing apparatus comprises: a piping through which exhaust gas from a process chamber flows in a first direction; and a plurality of traps spaced apart on the inner circumferential surface of the piping in the first direction. Each of the plurality of traps has: a recess on the inner circumferential surface recessed towards the outer side of the piping; and a shielding surface extending from the edge of the recess into the piping along a second direction intersecting the first direction.

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