Measurement apparatus, positioning apparatus, lithography apparatus, and article manufacturing method

TW202638004APending Publication Date: 2026-09-16CANON KK
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Patent Information

Application Number
TW115106577
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-28
Filing Date
2026-02-24
Publication Date
2026-09-16

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Abstract

The present disclosure provides A measurement apparatus that measures a position of a measurement target surface, comprising: a sensor including a facing portion which faces the measurement target surface, and configured to measure a position of the measurement target surface in a first state in which the facing portion is arranged at a predetermined spacing from the measurement target surface; and a moving unit configured to move at least the facing portion of the sensor, wherein the moving unit operates in a first mode for moving the facing portion in a direction away from the measurement target surface in accordance with reception of a first signal, and a second mode for moving the facing portion in the direction in accordance with reception of a second signal.
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