Masking and laser processing methods

Abstract

This invention relates to a mask for laser processing, comprising: a synthetic quartz substrate having a first side and a second side opposite to the first side; and a patterned light-shielding film having: a metal-containing film formed on the first side of the synthetic quartz substrate; and a metal film formed on the metal-containing film, wherein the compositions of the metal-containing film and the metal film are different from each other, and the reflectivity of the metal-containing film is 40% to 80% when irradiated by laser from the second side of the synthetic quartz substrate. This provides a mask that exhibits excellent durability in laser processing.

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