Exposure apparatus platform and its manufacturing method

TW202638175APending Publication Date: 2026-09-16NIPPON LIGHT METAL CO LTD
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Patent Information

Application Number
TW114147742
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-23
Filing Date
2025-12-05
Publication Date
2026-09-16

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Abstract

[Problem] To provide a carrier platform for an exposure apparatus and a method for manufacturing the same, which forms a coating film on a semiconductor packaging substrate and a printed circuit board having both easy peelability and UV resistance. [Solution] A carrier platform for an exposure apparatus comprises: an aluminum member having a porous anodized film formed on the surface of a substrate made of aluminum or an aluminum alloy; and a coating film formed on the surface of the anodized film and having a silicone layer comprising a silicone polymer (excluding silicone oil), wherein the silicone polymer substantially does not contain functional groups having fluorine atoms; and a method for manufacturing the carrier platform for an exposure apparatus comprises: an anodizing step of manufacturing the aluminum member by applying an anodizing treatment to the surface of the substrate to form the anodized film, and a coating film forming step of forming the coating film by applying a coating film forming treatment to the surface of the anodized film to form the silicone layer.
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