Exposure apparatus platform and its manufacturing method
TW202638175APending Publication Date: 2026-09-16NIPPON LIGHT METAL CO LTD
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Patent Information
- Application Number
- TW114147742
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-23
- Filing Date
- 2025-12-05
- Publication Date
- 2026-09-16
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Abstract
[Problem] To provide a carrier platform for an exposure apparatus and a method for manufacturing the same, which forms a coating film on a semiconductor packaging substrate and a printed circuit board having both easy peelability and UV resistance. [Solution] A carrier platform for an exposure apparatus comprises: an aluminum member having a porous anodized film formed on the surface of a substrate made of aluminum or an aluminum alloy; and a coating film formed on the surface of the anodized film and having a silicone layer comprising a silicone polymer (excluding silicone oil), wherein the silicone polymer substantially does not contain functional groups having fluorine atoms; and a method for manufacturing the carrier platform for an exposure apparatus comprises: an anodizing step of manufacturing the aluminum member by applying an anodizing treatment to the surface of the substrate to form the anodized film, and a coating film forming step of forming the coating film by applying a coating film forming treatment to the surface of the anodized film to form the silicone layer.
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