Method for ascertaining a positioning of individual mirrors of a facet mirror of an illumination optical unit of a projection exposure apparatus

TW202638179APending Publication Date: 2026-09-16CARL ZEISS SMT GMBH
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Patent Information

Application Number
TW115100722
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-09
Filing Date
2026-01-08
Publication Date
2026-09-16

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Abstract

is ascertained by specifying a set of basis functions (fi), assigning subsets of the individual mirrors to different basis functions from among said set of basis functions, ascertaining partial switching states of the individual mirrors of the individual mirror partitions for generating multiples of the basis functions as partition contributions, and storing the partial switching states of the individual mirrors in a storage device
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