Ultraviolet irradiation device and installation system

TW202638180APending Publication Date: 2026-09-16SHIBAURA MECHATRONICS CORP
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Patent Information

Application Number
TW115107702
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-12-18
Filing Date
2026-03-03
Publication Date
2026-09-16

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Abstract

The objective of this invention is to suppress the effects of oxygen inhibition when irradiating a resin film with attached electronic components using ultraviolet light to reduce adhesion. This invention provides an ultraviolet light irradiation apparatus and an mounting system. The ultraviolet light irradiation apparatus is for irradiating a resin film with multiple electronic components adhered to its first surface using ultraviolet light, and includes: a support platform for supporting the resin film; a gas supply unit for supplying an inert gas to the first surface of the resin film from a gas release unit facing the support platform; and a light source unit for irradiating a second surface of the resin film opposite to the first surface with ultraviolet light.
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