Analysis System

TW202638439APending Publication Date: 2026-09-16HITACHI HIGH TECH CORP
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Patent Information

Application Number
TW115107897
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-05
Filing Date
2026-03-04
Publication Date
2026-09-16

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Abstract

[Problem] To provide a technique for efficiently determining the cause of changes in reaction process data. [Solution] The analytical system disclosed herein includes: an analytical unit of an automatic analytical apparatus for measuring a mixture of a sample and a reagent; an acquisition unit for acquiring reaction process data obtained by the aforementioned analytical unit; a first determination unit for determining, using baseline reaction process data, which of a plurality of abnormal patterns exists or does not exist in the aforementioned reaction process data; a memory unit for storing the aforementioned plurality of abnormal patterns, measurement-related information, and the determination result of the aforementioned first determination unit; and a second determination unit for determining, when the aforementioned first determination unit determines that an abnormal pattern exists in the aforementioned reaction process data, the cause of the abnormality lies in the aforementioned sample, the aforementioned reagent, and the aforementioned analytical unit, based on the previously measured measurement-related information and the previously determined result.
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