Methods, apparatus and programs for depicting charged particle beams

TW202638478APending Publication Date: 2026-09-16NUFLARE TECH INC
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Patent Information

Application Number
TW114149448
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-11
Filing Date
2025-12-16
Publication Date
2026-09-16

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Abstract

[Problem to be solved] Using the same pattern data, patterns with the same line width and shape are drawn using drawing devices of different generations or drawing methods. [Solution] A charged particle beam drawing method for drawing patterns on a substrate using charged particle beams. In this method, the drawing area of ​​the substrate is imaginarily divided into a plurality of first mesh regions with a first mesh size. The pattern area density of each of the first mesh regions is calculated to create a first area density mapping map. The first area density mapping map is sampled using a second mesh region with a second mesh size smaller than the first mesh size to create a second area density mapping map defining the pattern area density of each of the second mesh regions. The irradiation dose of each of the second mesh regions is calculated using the second area density mapping map. The charged particle beam is then used to irradiate the substrate with the calculated irradiation dose.
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