Semiconductor devices and methods for manufacturing semiconductor devices

TW202638755APending Publication Date: 2026-09-16RAPIDUS CORP
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Patent Information

Application Number
TW114151219
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-10-14
Filing Date
2025-12-24
Publication Date
2026-09-16

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Abstract

A semiconductor device includes: a semiconductor substrate having a protrusion on a main surface side; a nanosheet stack made of a semiconductor material disposed on the protrusion of the semiconductor substrate; a gate electrode covering the entire circumference of each nanosheet constituting the nanosheet stack through a gate insulating film; and an oxide film continuously covering the area from the upper surface of the protrusion of the semiconductor substrate to the sidewall.
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