Semiconductor structure and fabricating method thereof

TW202638777APending Publication Date: 2026-09-16TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information

Application Number
TW114117750
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-14
Filing Date
2025-05-12
Publication Date
2026-09-16

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Abstract

High resistance structures and methods for making such structures are provided. A method includes performing a formation process to form a first sacrificial structure over a first region of a substrate; and replacing the first sacrificial structure with a high resistance structure.
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