Method of forming image sensor including air grid

Abstract

Disclosed herein are approaches for forming an air grid of an image sensor. One method may include depositing a first fill material within a first plurality of trenches to form a plurality of grid structures, wherein the first plurality of trenches is formed through an oxide layer formed over a substrate, wherein the fill material is formed along a sidewall and a bottom surface of each trench of the plurality of trenches, and wherein a void is formed within the fill material. The method may further include forming a second plurality of trenches through the oxide layer and the first fill material.

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