Ampoule for semiconductor precursor and method for providing precursor flow

TW202638818APending Publication Date: 2026-09-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW115103706
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-12-08
Filing Date
2021-12-07
Publication Date
2026-09-16

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Abstract

Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.
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