Substrate processing apparatus, processing liquid supply device, substrate processing method and processing liquid supply method

Abstract

A substrate processing apparatus includes a plurality of chambers, a processing liquid supply device and a controller. The processing liquid supply device includes a first temperature adjuster and a second temperature adjuster that adjust a temperature of a processing liquid supplied to the plurality of chambers, and a malfunction detector that detects a malfunction. In a case in which neither the first temperature adjuster nor the second temperature adjuster is malfunctioning, the controller sets a first number as the number of chambers to which the processing liquid can be simultaneously supplied from the processing liquid supply device. In a case in which only one of the first temperature adjuster and the second temperature adjuster is malfunctioning, a second number smaller than the first number is set as the number of chambers to which the processing liquid can be simultaneously supplied from the processing liquid supply device.

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