System and method for cleaning a chamber
TW202638888APending Publication Date: 2026-09-16APPLIED MATERIALS INC
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Patent Information
- Application Number
- TW114139241
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-19
- Filing Date
- 2025-10-13
- Publication Date
- 2026-09-16
Smart Images
Figure TWG2TA001076310_001 
Figure TWG2TA001076310_002 
Figure TWG2TA001076310_003
Abstract
Described herein are embodiments related to a chamber and method for cleaning herein including a dual gas line system. The chamber includes a first input line including a first outlet positioned within the chamber to output a first gas stream and a second input line including a second outlet positioned within the chamber to output a second gas stream. The first input gas line and the second input gas line are coaxial to each other, and the outlets directly face each other.
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