Semiconductor equipment

Abstract

This application provides a semiconductor device, including: a process chamber, a protective cover, a first liquid supply unit, a second liquid supply unit, a leakage detection unit, and a controller. The protective cover is located inside the process chamber, and has a first space inside the protective cover, with a second space between the protective cover and the process chamber. The first liquid supply unit is used to supply a first processing liquid to the first space; the second liquid supply unit is used to supply a second processing liquid to the second space. The leakage detection unit includes a drain pipe, a switching valve, and at least one level sensor. The drain pipe is located at the bottom of the process chamber and communicates with the second space. The switching valve and the level sensor are both disposed on the drain pipe, with the level sensor located above the switching valve.

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