Multi-beam writing apparatus and multi-beam writing method

Abstract

A multi-beam writing apparatus according to one aspect of the present invention is characterized by including: a stage configured to be movable and to mount thereon a substrate which is to be written with multiple beams; a stripe region generation circuit configured to generate a plurality of first stripe regions by dividing a writing region of the substrate such that a longer direction is in a first direction, and a plurality of second stripe regions by dividing the writing region of the substrate such that a longer direction is in a second direction having a predetermined relative angle to the first direction; and a writing mechanism configured to repeat tracking control so that an irradiation region of the multiple beams follows a movement of the stage, and to perform writing, during each the tracking control, regarding, as a group, a first stripe region of the plurality of first stripe regions and a second stripe region of the plurality of second stripe regions where some regions of the first stripe region and the second stripe region are overlapped with each other, to the group of the first stripe region and the second stripe region while moving the irradiation region of the multiple beams between the first stripe region and the second stripe region in a same group during one movement of the stage to move the writing in a writing direction.

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