Substrate processing apparatus

Abstract

A space-saving technique for gas-liquid separation is provided. The substrate processing apparatus includes: a rotating base 21 for holding a substrate W; a rotating shaft 25 mounted on the rotating base 21; a rotating motor 26 for rotating the rotating shaft 25 about a vertically extending rotation axis A1; a nozzle 31 for supplying processing liquid to the substrate W held on the rotating base 21; a bottomed cylindrical lower cup 41 disposed around and below the rotating base 21; an annular middle cup 43 located below the rotating base 21 and above the bottom wall 411 of the lower cup 41; and a cylindrical airflow distribution plate 50 erected upwards from the bottom wall 411 of the lower cup 41 toward the middle cup 43. The airflow distribution plate 50 has a plurality of openings 51. The lower cup 41 has: an exhaust port 611, which is radially disposed further inside the airflow distribution plate 50; and a drain port 631, which is radially disposed further outside the airflow distribution plate 50.

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