Cleaning equipment and cleaning system

TW202639238APending Publication Date: 2026-10-01SHIBAURA MECHATRONICS CORP
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Patent Information

Application Number
TW115104988
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-27
Filing Date
2026-02-09
Publication Date
2026-10-01

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    Figure TWG2TA001079322_003
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Abstract

This invention provides a cleaning apparatus for removing cleaning fluid adhering to components on a cleaning object during cleaning. The cleaning apparatus includes: a cleaning tank for housing the object to be cleaned; a holding portion for holding the object; a rotating shaft fixed to the holding portion; a cleaning fluid supply portion for supplying cleaning fluid to the object; a gas injection portion disposed above the object and supplying gas upwards; a fixed gas supply portion through which the rotating shaft passes, and having a first flow path for gas flow within it; and a rotating gas supply portion fixed to the rotating shaft and the gas injection portion, having a second flow path for gas flow within it, wherein, during rotation of the rotating gas supply portion, gas is supplied to the gas injection portion via the first and second flow paths.
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