Photosensitive or radiosensitive linear resin compositions, photoresist films, patterning methods, and manufacturing methods of electronic devices.

Abstract

The present invention provides a photosensitive radioactive or radioactive linear resin composition, a photoresist film using the above-mentioned photosensitive radioactive or radioactive linear resin composition, a pattern forming method, and a method for manufacturing an electronic device. The photosensitive radioactive or radioactive linear resin composition contains: an onium salt compound (I) which includes a cation and an organic anion having a specific structure; an onium salt compound (II) which includes an anion and an onium cation having a specific structure; an acid-degradable resin; and a solvent.