Radiation-sensitive linear compositions, resist patterning methods, polymers and compounds

Abstract

A radiosensitive linear composition comprising a polymer containing structural units represented by formula (1). In formula (1), L1 is a single bond, *1-CO-O-, *1-CO-NH-, or -O-. L2 and L3 are independently single bonds or divalent linkages. R3 is a single bond or a substituted or unsubstituted alkyl diel. A1 is an aromatic cyclic group or an aliphatic cyclic group with a valence of (r3+3). A2 is an aromatic cyclic group with a valence of (r1+r2+1). X1 is a halogen atom or a haloalkyl group. R4 is a monovalent substituent other than a halogen atom and a haloalkyl group. R5 is a monovalent substituent. r2 is an integer greater than or equal to 1. r1 and r3 are independently integers greater than or equal to 0. M+ is a radiosensitive linear cation.