Radiation-sensitive linear compositions, resist patterning methods, compounds and polymers

Abstract

A radiosensitive linear composition comprising a polymer having an acid-dissociable group, satisfying one or more of the first and second requirements. First requirement: It further comprises a compound represented by formula (1). Second requirement: The polymer contains structural units derived from the compound represented by formula (1). Ar1 is a group formed by removing (m+p+1) hydrogen atoms from an aromatic ring. Ar2 is a group formed by removing (n+q+1) hydrogen atoms from an aromatic ring. X1 and X2 are monovalent groups represented by formula (2), satisfying m+n≧1. Z- is an anion. L1 is -R3-O-*1, -CO-O-*1, or -O-CO-*1. R3 is an alkyldiyl group having 1 to 6 carbon atoms. R2 is an alkyldiyl group having 2 to 12 carbon atoms. R1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms, etc.