Semiconductor photoresist composition and method of forming patterns using the composition

TW202639494APending Publication Date: 2026-10-01SAMSUNG SDI CO LTD
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Patent Information

Application Number
TW115100636
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-17
Filing Date
2026-01-07
Publication Date
2026-10-01

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Abstract

A semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition are provided. The semiconductor photoresist composition includes an organometallic compound, a compound including four or more hydroxyl groups and one or more ether bonds, and a solvent.
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