Photoacid generator compound, photoresist compositions including the same, and pattern formation methods
TW202639510APending Publication Date: 2026-10-01DuPont Electronic Materials International LLC
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Patent Information
- Application Number
- TW114150785
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-26
- Filing Date
- 2025-12-23
- Publication Date
- 2026-10-01
Abstract
polyalicyclic group,; each L1 is independently a single bond or one or more linking groups, wherein L1 is free of fluorine; each X1 is independently -O-, -S-, -N(R2)-, -C(O)-, -S(O)R2-, or -S(O2)R2-, wherein R2 is independently chosen from substituted or unsubstituted
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