Radiosensitive linear components, patterning methods and compounds

Abstract

The present invention aims to provide a radiosensitive linear composition, a patterning method, and a compound capable of forming a resist film that can fully exert its sensitivity, exposure latitude, depth of focus, pattern rectangularity, pattern circularity, CDU, LWR, and defect suppression properties. A radiosensitive linear composition comprises a radiosensitive linear acid generator, a polymer, and a solvent, wherein the radiosensitive linear acid generator has a partial structure represented by the following formula (a-1) and a sulfonyl group, and is nonionic.

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