Resist composition, laminate and patterning process

TW202639529APending Publication Date: 2026-10-01SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
TW115101928
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-20
Filing Date
2026-01-19
Publication Date
2026-10-01

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Abstract

The present invention provides a resist composition which can achieve high sensitivity and high resolvability in a patterning process. A resist composition containing a hypervalent iodine compound represented by the following formula
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