Precursors and methods for depositing metal-containing films

TW202639571APending Publication Date: 2026-10-01ENTEGRIS INC
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Patent Information

Application Number
TW115107181
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-28
Filing Date
2026-02-26
Publication Date
2026-10-01

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Abstract

Precursors and methods for depositing metal-containing films are provided herein. The method includes obtaining a substrate comprising a plurality of halides. The method includes obtaining a reducing agent. The method includes contacting the substrate with the reducing agent to remove at least a portion of the plurality of halides. Related compositions and articles are also provided.
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