Resin composition, photosensitive resin composition, cured product, laminate, production method for cured product, production method for semiconductor device, and semiconductor device
TW202639689APending Publication Date: 2026-10-01FUJIFILM CORP
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW115103870
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-05-12
- Filing Date
- 2026-01-30
- Publication Date
- 2026-10-01
Abstract
The present invention aims to provide a resin composition and a photosensitive resin composition with excellent long-term stability, as well as a method for manufacturing a cured material, a laminate, a method for manufacturing a cured material, and a semiconductor device. The resin composition of the present invention comprises at least one resin selected from the group consisting of polyimides having vinyl unsaturated groups and polyimide precursors having vinyl unsaturated groups, and a polymerization inhibitor having vinyl unsaturated groups.
Need to check novelty before this filing date? Find Prior Art
