Low-refractive-index films containing hollow silicon dioxide and their manufacturing methods

TW202639723APending Publication Date: 2026-10-01NISSAN CHEM CORP
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Patent Information

Application Number
TW115103177
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-26
Filing Date
2026-01-27
Publication Date
2026-10-01

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Abstract

The object of this invention is to provide a thin film with a lower refractive index compared to previous thin films. This object is a low-refractive-index film comprising hollow silica. This is achieved by a method for manufacturing a low-refractive-index film comprising the following steps: mixing the aforementioned hollow silica, polymer, and additives to obtain a mixture; coating the mixture onto a substrate; obtaining a hardened film by heating and / or light irradiation; and subjecting the hardened film to a cleaning process.
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