Semiconductor processing components and processing methods

TW202639827APending Publication Date: 2026-10-01JSR CORPORATION
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Patent Information

Application Number
TW115108836
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-17
Filing Date
2026-03-10
Publication Date
2026-10-01
Patent Text Reader

Abstract

This invention provides a semiconductor processing composition and a processing method thereon. The semiconductor processing composition improves storage stability, maintaining good processing characteristics even after a specified storage period, thereby improving the yield of semiconductor device manufacturing. The semiconductor processing composition of this invention comprises: (A) a compound represented by the following general formula (1); (B) a compound having at least one functional group selected from the group consisting of carboxyl groups and their salts, and at least one functional group selected from the group consisting of phenolic hydroxyl groups and their salts; (C) a compound having at least one functional group selected from the group consisting of amino groups and their salts, and a hydroxyl group (excluding compounds represented by the following general formula (1), compounds having carboxyl groups, and nitrogen-containing heterocyclic compounds); and (D) a liquid medium, wherein when the content of component (A) is set as MA [mass%] and the content of component (B) is set as MB [mass%], MA / MB = 0.03 to 15. R2N(OH) ····(1) (In the formula (1), each R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; wherein at least one of the two Rs is an alkyl group having 1 to 4 carbon atoms)
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