Substrate cleaning liquid, method for producing substrate cleaned using same, and method for producing device

Abstract

[Problem] To obtain a substrate cleaning liquid capable of cleaning a substrate and removing particles. [Solution] A substrate cleaning liquid comprising a hydrophobic polymer(A), a polar compound(B), and a solvent(C): wherein the polar compound(B)is soluble in water. The substrate cleaning liquid is a highly functional material that can be used in a semiconductor device production step of a nanotechnology process, for example, a step of producing a semiconductor device that controls liquid crystals, quantum dots, or OLED displays formed on a substrate.