Methods for controlling the movement of magnetrons, electronic devices, and readable storage media
TW202639904APending Publication Date: 2026-10-01ADVANCED MICRO FAB EQUIP INC CHINA
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW115107238
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-19
- Filing Date
- 2026-02-26
- Publication Date
- 2026-10-01
Smart Images

Figure TWG2TA001079428_001 
Figure TWG2TA001079428_002 
Figure TWG2TA001079428_003
Abstract
This invention discloses a method for controlling the motion of a magnetron, an electronic device, and a readable storage medium, applied to a magnetron sputtering source. The magnetron sputtering source includes a magnetron and a driving device. The driving device controls the magnetron's rotation and revolution around the center of the target material to periodically scan the entire target area. The revolution and rotation angular velocities of the magnetron are varied to ensure that the magnetron's trajectory does not overlap within one motion cycle. This invention can achieve efficient utilization of the target material and uniformity of the thin film thickness by optimizing the magnetron's trajectory and magnetic field distribution.
Need to check novelty before this filing date? Find Prior Art
