Method and apparatus for ion beam directional deposition

Abstract

A deposition system has an ion deposition apparatus configured to direct a deposition species toward a workpiece along a path. The workpiece has one or more features having a gap defined by the one or more features. A workpiece support holds the workpiece to receive the deposition species at a predetermined tilt angle with respect to the path. The ion deposition apparatus deposits the deposition species on the one or more features, the workpiece support rotates the workpiece with respect to the path, growing a deposition film of the deposition species on the one or more features in a predetermined manner. The deposition film can seal the gap to define a sealed cavity. Alternatively, the one or more features can be a mask that is augmented by the deposition film to increase one or more dimensions of the mask.

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