A method for forming a structure and a system for the same

TW202639915APending Publication Date: 2026-10-01ASM IP HLDG BV
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Patent Information

Application Number
TW114149360
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-20
Filing Date
2025-12-16
Publication Date
2026-10-01

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Abstract

Methods and systems suitable for gas-phase processes are disclosed. An exemplary method includes treating a top surface of a substrate to form a treated surface by exposing the top surface to a treatment gas and vacuum ultraviolet radiation and depositing flowable material by providing a precursor and a reactant to form a deposited material. The method can further comprise treating a top surface of the deposited material by providing a cure gas and vacuum ultraviolet radiation. Methods and systems can be used to obtain desired profiles of deposited material on a substrate surface comprising high aspect ratio features.
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