Gas exhaust conduit pair, and semiconductor processing apparatus

TW202639920APending Publication Date: 2026-10-01ASM IP HLDG BV
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Patent Information

Application Number
TW114145433
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-05
Filing Date
2025-11-21
Publication Date
2026-10-01

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    Figure TWG2TA001078536_002
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    Figure TWG2TA001078536_003
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Abstract

A gas exhaust conduit pair comprising a first gas exhaust conduit and a second gas exhaust conduit is disclosed. The first gas exhaust conduit comprises a first end configured for coupling to a first gas exhaust line; a second, closed end opposite the first end; a first gas exhaust conduit wall extending in a first direction between the first end and the second end and enclosing a first gas conduction channel; and a first set of holes in the first gas exhaust conduit wall. The second gas exhaust conduit comprises a first end configured for coupling to a second gas exhaust line; a second, closed end opposite the first end; a second gas exhaust conduit wall extending the first direction between the first end and the second end and enclosing a second gas conduction channel; and a second set of holes in the second gas exhaust conduit wall. The first set of holes has a different arrangement to the second set of holes.
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