Apparatus and methods for providing vapor mass flow rate of liquid or solid feedstock to a CVD reactor

Abstract

An apparatus for providing a vapor mass flow rate of a liquid or solid feedstock for feeding into a process chamber (7) of a CVD reactor (1) has a container (2) for containing and evaporating the feedstock (2'), which is connected to an inlet line (3) and has an outlet line (4) leading out from the container. The inlet line (3) has a source mass flow controller (5) for controlling the carrier gas flow (F3) fed into the container (2). The outlet line (4) is fluidly connected to the CVD reactor (1) to feed vapor transported by the carrier gas through the outlet line (4) into the process chamber (7) of the CVD reactor (1). The total pressure of the container (2) can be maintained at a preset value by means of a pressure regulator (9) fluidly connected to the outlet line (4). A first gas split (F1) consisting of the carrier gas and the vapor flows through the pressure regulator (9). In order to precisely change the steam mass flow rate flowing into the CVD reactor (1) over time, it is proposed that the first gas stream (F1) flowing through the pressure regulator (9) does not flow into the process chamber (7), and the second gas stream (F2) consisting of carrier gas and steam, controlled by the feed mass flow controller (10) located in the discharge line (4), flows into the process chamber (7).

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