Echant composition and manufacturing method of metal pattern using the same
TW202639949APending Publication Date: 2026-10-01DONGJIN SEMICHEM CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114142796
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-12
- Filing Date
- 2025-11-04
- Publication Date
- 2026-10-01
Smart Images
Figure 00000000_0000_ABST
Abstract
The present invention relates to an etching solution composition and a method for preparing a metal pattern therefrom, the etching solution composition comprising: 10 to 40 wt% of at least one organic acid; 1 to 10 wt% of sulfonic acid; 15 to 25 wt% of sulfate; 0.001 to 10 wt% of corrosion inhibitor; and the remainder being solvent.
Need to check novelty before this filing date? Find Prior Art