Thermal radiation profile control

Abstract

A method includes initiating a process with respect to a substrate located on a substrate support apparatus, obtaining, from a set of thermal radiation detectors located underneath the substrate support apparatus, thermal radiation measurements each corresponding to a respective location of the substrate support apparatus, determining a thermal radiation profile of the substrate support apparatus based on the thermal radiation measurements, determining whether the thermal radiation profile of the substrate support apparatus satisfies a threshold condition, in response to determining that the thermal radiation profile of the substrate support apparatus does not satisfy the threshold condition, modifying operation of a first set of heat sources to adjust the thermal radiation profile of the substrate support apparatus, and modifying, based at least in part on the operation of the first set of heat sources, operation of a second set of heat sources to adjust a thermal radiation profile of the substrate.

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