Inspection device and inspection method

TW202640132APending Publication Date: 2026-10-01HAMAMATSU PHOTONICS KK
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Patent Information

Application Number
TW114145702
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-09
Filing Date
2025-11-24
Publication Date
2026-10-01

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    Figure TWG2TA001078546_003
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Abstract

The inspection device 1 of the present invention includes: an X-ray source 2 having an electron gun 21 and a target 22; a control unit 3 that controls the incident position of the electron beam EB between a first incident position Y1 and a second incident position Y2; an X-ray detection unit 4 that acquires an X-ray image of a target object OJ; and an inspection unit 51 that inspects the target object OJ based on the X-ray image; wherein the X-ray detection unit 4 acquires a first image as an X-ray image when the incident position of the electron beam EB is the first incident position Y1, and acquires a second image as an X-ray image when the incident position of the electron beam EB is the second incident position Y2, and the inspection unit 51 inspects the target object OJ based on at least one of the first image and the second image.
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