Method for manufacturing a substrate with a conductive film, a reflective photomask substrate, a reflective photomask, and a reflective photomask.

Abstract

This invention provides a substrate with a conductive film having a conductive film exhibiting high in-plane uniformity of transmittance. The substrate comprises a substrate and a conductive film disposed on one side of the substrate. The conductive film has a lower layer disposed on the substrate side and an upper layer disposed at the position furthest from the substrate. The lower and upper layers each contain one or more elements selected from the group consisting of tantalum and chromium. The transmittance at a wavelength of 632 nm is lower for either the upper or lower layer at the center of the substrate than for the layer at the end of the substrate. The transmittance at a wavelength of 632 nm is higher for the other layer at the center of the substrate than for the other layer at the end of the substrate.

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