Method of lithography tool
TW202640302APending Publication Date: 2026-10-01TSMC CHINA COMPANY +1
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Patent Information
- Application Number
- TW114120753
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-26
- Filing Date
- 2025-06-03
- Publication Date
- 2026-10-01
Smart Images
Figure TWG2TA001078183_001 
Figure TWG2TA001078183_002 
Figure TWG2TA001078183_003
Abstract
A method includes fixing a supporting bracket to a working table in a lithography tool; placing a lifting device on the supporting bracket; lifting an optical element in lithography tool, using the lifting device, from a first level to a second level higher than the first level; rotating the optical element through a shaft connected with the optical element; and repairing the optical element.
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