Apparatus for and method of laser speckle reduction

TW202640304APending Publication Date: 2026-10-01CYMER INC
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Patent Information

Application Number
TW114147648
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-18
Filing Date
2025-12-05
Publication Date
2026-10-01

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Abstract

Apparatus for and method of controlling a pattern variation in a semiconductor exposure tool in which the divergence of a beam of laser radiation generated by a laser radiation source is caused to assume a value greater than the smallest divergence the laser radiation source can achieve but less than a specified maximum for beam divergence for an exposure device using the beam of laser radiation.
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