Alignment apparatus, lithography apparatus, and article manufacturing method

TW202640309APending Publication Date: 2026-10-01CANON KK
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Patent Information

Application Number
TW115109620
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-17
Filing Date
2026-03-16
Publication Date
2026-10-01

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Abstract

An alignment apparatus for performing alignment between an original and a substrate, the original having a pattern and a mark, and the substrate having a convex portion to which the pattern is to be transferred. The alignment apparatus includes an image capturing device configured to capture, through one of the original and the substrate, an image of the other of the original and the substrate, and a controller configured to control the alignment based on an image obtained by the image capturing device. The image includes a part of an outer edge of the convex portion of the substrate and the mark of the original.
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