A method for lithographic exposure of a substrate, a lithographic exposure system for carrying out such a method, and a computer program element

Abstract

to be created by the exposure when the functional units are in their target positions, measuring the substrate with the functional units with a measuring device for the determination of the actual positions of the functional units, dividing the substrate into zones, in particular with at least one functional unit, determining a deviation between the actual positions and the target positions for the functional units and / or zones by means of an analysis device, and primarily adapting the exposure plan to the deviation between the actual position and the target position with regard to the structure to be created in the region

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